Polishing Cloth Selection Guide

Guide to selecting the right polishing cloth for your application, including PACE Technologies pad recommendations.

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Coarse / Intermediate Polishing Pads

CERMESH

(Available from PACE Technologies)

Metal mesh pad for semi-fixed abrasive coarse to intermediate lapping. Excellent for initial removal of damage from sectioning and hard materials.

Recommended: 9-15 μm diamond

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POLYPAD

(Available from PACE Technologies)

Durable synthetic polyester pad ideal for intermediate polishing, especially with 6–15 μm diamond abrasives. Designed as a long-life nylon alternative.

Recommended: 6-15 μm diamond

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TEXPAN

(Available from PACE Technologies)

Widely used non-woven intermediate polishing pad, compatible with most diamond suspensions. Effective across a broad range of materials.

Recommended: 3-15 μm diamond

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Black CHEM 2

(Available from PACE Technologies)

Porometric polymer pad with rubber-like consistency, offering balanced action between low and high nap pads. Ideal for moderate nap intermediate polishing.

Recommended: 3-9 μm diamond

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DACRON II

(Available from PACE Technologies)

Low-napped soft polishing pad widely used in Europe for intermediate steps on metals. Suitable for 1–15 μm diamond abrasives.

Recommended: 1-15 μm diamond

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NYPAD

(Available from PACE Technologies)

Low-napped silk pad tailored for intermediate polishing of harder metals and alloys. Performs well with mid-size diamond abrasives.

Recommended: 3-9 μm diamond

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GOLD PAD

(Available from PACE Technologies)

Low-napped pad ideal for 1–9 μm polishing. Designed for consistent material removal and flatness control during final pre-polishing.

Recommended: 1-9 μm diamond

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Final Polishing Pads

ATLANTIS

(Available from PACE Technologies)

Woven low-nap final polishing pad with foam backing for enhanced compliance. Ideal for 1–6 μm diamond. Great for critical surface flatness needs.

Recommended: 1-6 μm diamond

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MICROPAD

(Available from PACE Technologies)

High-napped final polishing pad ideal for producing a mirror finish on metals and polymers. Recommended for <1 μm diamond or colloidal silica.

Recommended: <1 μm diamond, colloidal silica

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TRICOTE

(Available from PACE Technologies)

Tight high-napped final polishing pad for metals. Offers better control of surface texture and minimal abrasive drag.

Recommended: <1 μm diamond

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NAPPAD

(Available from PACE Technologies)

Very high-napped final polishing pad tailored for soft metals and polymers. Provides gentle polishing action to minimize pull-out and relief.

Recommended: <1 μm diamond, soft materials

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MOLTEC 2

(Available from PACE Technologies)

Wool-based final polishing cloth used when edge retention is not critical. Works well with alumina and colloidal silica on metals.

Recommended: Colloidal silica, alumina

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FELT PAD

(Available from PACE Technologies)

Thick final polishing pad made for large samples or glass. Ideal for use with colloidal silica or alumina slurries where surface uniformity is key.

Recommended: Colloidal silica, alumina

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Selection Guidelines

  • Hard materials: Use harder pads (CERMESH, TEXPAN) for initial steps
  • Soft materials: Use softer pads (NAPPAD, MICROPAD) to minimize relief
  • Final polishing: Use high-nap pads (MICROPAD, TRICOTE) for mirror finish

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Browse our complete selection of PACE Technologies polishing pads, available in multiple sizes and backing options.

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Need More Help?

Use our Polishing Time Calculator or check out our comprehensive polishing methods guide.